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Control of thickness and orientation of solution-grown silicon nanowires

Author
HOLMES, J. D1 ; JOHNSTON, K. P1 ; DOTY, R. C1 ; KORGEL, B. A1
[1] Department of Chemical Engineering and Texas Materials Institute, University of Texas, Austin, TX 78712, United States
Source

Science (Washington, D.C.). 2000, Vol 287, Num 5457, pp 1471-1473

CODEN
SCIEAS
ISSN
0036-8075
Scientific domain
Multidisciplinary
Publisher
American Association for the Advancement of Science, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Commande processus Confinement Croissance cristalline en solution Echelle nanométrique Effet quantique Epaisseur Etude expérimentale Fil Matériau semiconducteur Orientation cristalline Photoluminescence Silicium Si Non métal
Keyword (en)
Process control Confinement Crystal growth from solutions Nanometer scale Quantum effect Thickness Experimental study Wires Semiconductor materials Crystal orientation Photoluminescence Silicon Nonmetals
Keyword (es)
Efecto cuántico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A10 Methods of crystal growth; physics of crystal growth / 001B80A10D Growth from solutions

Pacs
8110D Growth from solutions

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1301142

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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