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Surface kinetics of GaN evaporation and growth by molecular-beam epitaxy

Author
KARPOV, S. Yu1 ; TALALAEV, R. A1 ; MAKAROV, Yu. N2 ; GRANDJEAN, N3 ; MASSIES, J3 ; DAMILANO, B3
[1] Soft-Impact Ltd, P.O. Box 33, 194156 St Petersburg, Russian Federation
[2] Fluid Mechanics Department, University of Erlangen-Nürnberg, 4 Cauerstrasse, 91058 Erlangen, Germany
[3] Centre de Recherche sur l'Hétéro-Epitaxie et ses Applications, Centre National de la Recherche Scientifique, rue B. Grégory-Sophia Antipolis, 06560 Valbonne, France
Source

Surface science. 2000, Vol 450, Num 3, pp 191-203 ; ref : 27 ref

CODEN
SUSCAS
ISSN
0039-6028
Scientific domain
General chemistry, physical chemistry; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics; Polymers, paint and wood industries
Publisher
Elsevier Science, Amsterdam / Elsevier Science, Lausanne / Elsevier Science, New York, NY
Publication country
Netherlands
Document type
Article
Language
Russian
Keyword (fr)
Adsorption Ammoniac Cinétique Epitaxie jet moléculaire Etude expérimentale Etude théorique Evaporation Gallium nitrure Matériau semiconducteur Ga N GaN Composé minéral
Keyword (en)
Adsorption Ammonia Kinetics Molecular beam epitaxy Experimental study Theoretical study Evaporation Gallium nitrides Semiconductor materials Inorganic compounds
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H45 Solid-fluid interfaces / 001B60H45D Adsorption and desorption kinetics; evaporation and condensation

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1320315

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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