The growth and structure of epitaxial niobium on sapphire
- Author
- WILDES, A. R1 ; MAYER, J2 ; THEIS-BRÖHL, K3
[1] Institut Laue-Langevin, Avenue des Martyrs, BP 156, 38042 Grenoble, France
[2] Gemeinschaftslabor für Elektronenmikroskopie (GFE), RWTH Aachen, Ahornstr, 55, 52074 Aachen, Germany
[3] Institut für Experimentalphysik/Festkörperphysik, Ruhr-Universität Bochum, 4470 Bochum, Germany - Source
Thin solid films. 2001, Vol 401, Num 1-2, pp 7-34 ; ref : 127 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Aluminium oxyde Article synthèse Couche épitaxique Croissance cristalline en phase vapeur Diffraction RX Epitaxie jet moléculaire Etude expérimentale Etude théorique Haute résolution Hétéroépitaxie Interface solide solide Magnétron Microscopie force atomique Microscopie électronique transmission Modèle Niobium Orientation cristalline Pulvérisation cathodique RHEED Relation orientation Saphir Structure cristalline Substrat Ultravide Nb Substrat saphir Composé minéral Métal transition
- Keyword (en)
- Aluminium oxides Reviews Epitaxial layers Crystal growth from vapors XRD Molecular beam epitaxy Experimental study Theoretical study High-resolution methods Heteroepitaxy Solid-solid interfaces Magnetrons Atomic force microscopy Transmission electron microscopy Models Niobium Crystal orientation Cathode sputtering RHEED Orientation relation Sapphire Crystal structure Substrates Ultrahigh vacuum Inorganic compounds Transition elements
- Keyword (es)
- Heteroepitaxia Modelo Relación orientación
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13405246
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(01)01631-5 
https://dx.doi.org/10.1016/S0040-6090(01)01631-5
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