Neutral electroless silver plating using imidazole and succinimide as reducing and complex agents on nickel-phosphorus substrate
- Author
- NAWAFUNE, Hidemi1 ; SHIROGUCHI, Keiko2 ; MIZUMOTO, Shozo1 ; KOHASHI, Yasuhito3 ; OBATA, Keigo3
[1] Faculty of Science and Engineering, High Technology Research Center, Konan University, 8-9-1, Okamoto, Higashinada-ku, Kobe-shi, Hyogo 658-8501, Japan
[2] Graduate School of Science, Konan University, 8-9-1, Okamoto, Higashinada-ku, Kobe-shi, Hyogo 658-8501, Japan
[3] DAIWA FINE CHEMICALS Co., Ltd., 21-8, Minamifutami, Futami-cho, Akashi-shi, Hyogo 674-0093, Japan - Source
Hyomen gijutsu. = Journal of the Surface Finishing Society of Japan. 2001, Vol 52, Num 11, pp 768-772 ; ref : 6 ref
- ISSN
- 0915-1869
- Scientific domain
- Metallurgy, welding
- Publisher
- Hyomen Gijutsu Kyokai, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Alliage base nickel Argent Composé organique Courbe intensité potentiel Dépôt chimique Imidazole Phosphore alliage Revêtement métallique Réducteur Traitement surface Alliage NiP Ni P
- Keyword (en)
- Nickel base alloys Silver Organic compounds Intensity potential curve Chemical deposition Imidazole Phosphorus alloys Metal coating Reducing agent Surface treatment
- Keyword (es)
- Plata Compuesto orgánico Curva intensidad potencial Depósito químico Revestimiento metálico Reductor Tratamiento superficie
- Keyword (de)
- Silber Organische Verbindung Stromloses Beschichten Metallischer Ueberzug Reduktionsmittel Oberflaechenbehandlung
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06D Metallic coatings
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13422919
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.4139/sfj.52.768 
https://dx.doi.org/10.4139/sfj.52.768
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