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Strain in the HWE-grown ZnTe/(100) GaAs hetero-interface

Author
KIM, B. J1 ; WANG, J. F1 ; ISHIKAWA, Y1 ; PARK, Y.-G1 ; SINDO, D1 ; ABE, S2 ; MASUMOTO, K2 ; ISSHIKI, M1
[1] Institute for Advanced Materials Processing, Tohoku University, 1-1, 2-Chome Katahira, Aobaku, Sendai 980-8577, Japan
[2] The Research Institute for Electric and Magnetic Materials, 2-1-1 Yagiyama-minami, Sendai 982-0807, Japan
Source

Journal of crystal growth. 2002, Vol 235, Num 1-4, pp 201-206 ; ref : 8 ref

CODEN
JCRGAE
ISSN
0022-0248
Scientific domain
Crystallography; Geology; Metallurgy, welding
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Accommodation réseau Caractérisation Contrainte résiduelle Couche mince Cristallinité Croissance cristalline en phase vapeur Distribution contrainte Epitaxie Etude expérimentale Hétérojonction Interface solide solide Méthode paroi chaude Perfection cristalline Semiconducteur II-VI Zinc tellurure Substrat GaAs Te Zn ZnTe Composé minéral Métal transition composé
Keyword (en)
Mismatch lattice Characterization Residual stresses Thin films Crystallinity Crystal growth from vapors Stress distribution Epitaxy Experimental study Heterojunctions Solid-solid interfaces Hot wall growth Crystal perfection II-VI semiconductors Zinc tellurides Inorganic compounds Transition element compounds
Keyword (es)
Acomodación red Caracterización Cristalinidad Método pared caliente Perfección cristalina
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase

Pacs
8115K Vapor phase epitaxy; growth from vapor phase

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13457813

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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