In flight treatment of metallurgical silicon powder by rf thermal plasma: elaboration of hydrogenated silicon deposit on a substrate
- Author
- BENMANSOUR, M1 ; FRANCKE, E1 ; MORVAN, D1 ; AMOUROUX, J1 ; BALLUTAUD, D2
[1] Laboratoire de Génie des Procédés Plasmas, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris, France
[2] Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 place Aristide Briand, 92195 Meudon, France - Conference title
- Proceeding of Symposium P on Thin Film Materials for Photovoltaics, E-MRS Spring Conference, Strasbourg, France, June 5-8, 2001
- Conference name
- E-MRS Spring Conference, Symposium P: Thin Film Materials for Photovoltaics (Strasbourg 2001-06-05)
- Author (monograph)
- SLAOUI, A (Editor)2 ; POORTMANS, J (Editor)1 ; JÄGER-WALDAU, A (Editor)3 ; BRABEC, C (Editor)4
European Materials Research Society (E-MRS), Strasbourg, France (Funder/Sponsor)
[1] IMEC vzw, Kapeldreef 75, 3001 Leuven, Belgium
[2] CNRS-PHASE, 23 rue du Loess, 67037 Strasbourg, France
[3] EC-JRC, El-Renewable Energies, Ispra, Italy
[4] SIEMENS AG, Erlangen, Germany - Source
Thin solid films. 2002, Vol 403-04, pp 112-115 ; ref : 9 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Caractérisation Concentration impureté Couche épaisse Croissance cristalline en phase vapeur Décharge haute fréquence Dépôt plasma Effusion Etude expérimentale Hydrogénation Hétérodiffusion Plasma thermique Purification Revêtement Semiconducteur Silicium Si:H Non métal
- Keyword (en)
- Characterization Impurity density Thick films Crystal growth from vapors High-frequency discharges Plasma deposition Effusion Experimental study Hydrogenation Impurity diffusion Thermal plasma Purification Coatings Semiconductor materials Silicon Nonmetals
- Keyword (es)
- Caracterización Concentración impureza Heterodifusión Plasma térmico
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase
- Discipline
- Physics and materials science Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13496184
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(01)01564-4 
https://dx.doi.org/10.1016/S0040-6090(01)01564-4
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