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In flight treatment of metallurgical silicon powder by rf thermal plasma: elaboration of hydrogenated silicon deposit on a substrate

Author
BENMANSOUR, M1 ; FRANCKE, E1 ; MORVAN, D1 ; AMOUROUX, J1 ; BALLUTAUD, D2
[1] Laboratoire de Génie des Procédés Plasmas, Université Pierre et Marie Curie, ENSCP, 11 rue Pierre et Marie Curie, 75231 Paris, France
[2] Laboratoire de Physique des Solides et de Cristallogénèse, CNRS, 1 place Aristide Briand, 92195 Meudon, France
Conference title
Proceeding of Symposium P on Thin Film Materials for Photovoltaics, E-MRS Spring Conference, Strasbourg, France, June 5-8, 2001
Conference name
E-MRS Spring Conference, Symposium P: Thin Film Materials for Photovoltaics (Strasbourg 2001-06-05)
Author (monograph)
SLAOUI, A (Editor)2 ; POORTMANS, J (Editor)1 ; JÄGER-WALDAU, A (Editor)3 ; BRABEC, C (Editor)4
European Materials Research Society (E-MRS), Strasbourg, France (Funder/Sponsor)
[1] IMEC vzw, Kapeldreef 75, 3001 Leuven, Belgium
[2] CNRS-PHASE, 23 rue du Loess, 67037 Strasbourg, France
[3] EC-JRC, El-Renewable Energies, Ispra, Italy
[4] SIEMENS AG, Erlangen, Germany
Source

Thin solid films. 2002, Vol 403-04, pp 112-115 ; ref : 9 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Caractérisation Concentration impureté Couche épaisse Croissance cristalline en phase vapeur Décharge haute fréquence Dépôt plasma Effusion Etude expérimentale Hydrogénation Hétérodiffusion Plasma thermique Purification Revêtement Semiconducteur Silicium Si:H Non métal
Keyword (en)
Characterization Impurity density Thick films Crystal growth from vapors High-frequency discharges Plasma deposition Effusion Experimental study Hydrogenation Impurity diffusion Thermal plasma Purification Coatings Semiconductor materials Silicon Nonmetals
Keyword (es)
Caracterización Concentración impureza Heterodifusión Plasma térmico
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15K Vapor phase epitaxy; growth from vapor phase

Pacs
8115K Vapor phase epitaxy; growth from vapor phase

Discipline
Physics and materials science Physics of gases, plasmas and electric discharges
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13496184

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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