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Influence of molecule dwell time on μc-Si:H properties

Author
COSCIA, U1 ; AMBROSONE, G1 ; MADDALENA, P1 ; LETTIERI, S1 ; AMBRICO, M2 ; MINARINI, C3
[1] INFM-Dipartimento di Scienze Fisiche, Università Federico II', Via Cintia, 80126 Napoli, Italy
[2] CNR-CSCP, Via Orabona 4, 70126 Bari, Italy
[3] ENEA, via Vecchio Macello, 80055 Portici (NA), Italy
Conference title
Proceeding of Symposium P on Thin Film Materials for Photovoltaics, E-MRS Spring Conference, Strasbourg, France, June 5-8, 2001
Conference name
E-MRS Spring Conference, Symposium P: Thin Film Materials for Photovoltaics (Strasbourg 2001-06-05)
Author (monograph)
SLAOUI, A (Editor)2 ; POORTMANS, J (Editor)1 ; JÄGER-WALDAU, A (Editor)3 ; BRABEC, C (Editor)4
European Materials Research Society (E-MRS), Strasbourg, France (Funder/Sponsor)
[1] IMEC vzw, Kapeldreef 75, 3001 Leuven, Belgium
[2] CNRS-PHASE, 23 rue du Loess, 67037 Strasbourg, France
[3] EC-JRC, El-Renewable Energies, Ispra, Italy
[4] SIEMENS AG, Erlangen, Germany
Source

Thin solid films. 2002, Vol 403-04, pp 130-134 ; ref : 11 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Keyword (fr)
Addition hydrogène Cinétique Couche mince Croissance cristalline en phase vapeur Décharge haute fréquence Dépôt chimique phase vapeur Etude expérimentale Grosseur grain Microcristal Microstructure Méthode PECVD Orientation cristalline Physique plasma Relation fabrication propriété Relation fabrication structure Semiconducteur Silicium Spectre IR proche Spectre absorption Si:H Non métal
Keyword (en)
Hydrogen additions Kinetics Thin films Crystal growth from vapors High-frequency discharges CVD Experimental study Grain size Microcrystal Microstructure PECVD Crystal orientation Plasma physics Fabrication property relation Fabrication structure relation Semiconductor materials Silicon Near infrared spectrum Absorption spectra Nonmetals
Keyword (es)
Microcristal Relación fabricación propiedad Relación fabricación estructura Espectro IR próximo
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science Physics of gases, plasmas and electric discharges
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13496188

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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