Electroless Ni-B plating in the tartrate-complexed Ni solution
- Author
- ONO, Yasushi1 ; YAMASHITA, Yoshiji2 ; YASUDA, Morihiro
[1] Faculty of Engineering, Niigata University, 8050, 2-nocho, Ikarashi, Niigata-shi, Niigata 950-2181, Japan
[2] Graduate School of Science and Technology, Niigata University, 8050, 2-nocho, Ikarashi, Niigata-shi, Niigata 950-2181, Japan - Source
Hyomen gijutsu. = Journal of the Surface Finishing Society of Japan. 2002, Vol 53, Num 1, pp 65-70 ; ref : 16 ref
- ISSN
- 0915-1869
- Scientific domain
- Metallurgy, welding
- Publisher
- Hyomen Gijutsu Kyokai, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Alliage base nickel Bore alliage Dépôt chimique Effet concentration Plomb nitrate Revêtement métallique Stabilisant Thiodiglycol Thiourée Traitement surface Vitesse dépôt Alliage NiB B Ni
- Keyword (en)
- Nickel base alloys Boron alloys Chemical deposition Concentration effect Lead nitrate Metal coating Stabilizer agent Thiodiglycol Thiourea Surface treatment Deposition rate
- Keyword (es)
- Depósito químico Efecto concentración Plomo nitrato Revestimiento metálico Estabilizante Tiodiglicol Tiourea Tratamiento superficie Velocidad deposición
- Keyword (de)
- Stromloses Beschichten Bleinitrat Metallischer Ueberzug Oberflaechenbehandlung Abschmelzleistung
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06D Metallic coatings
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13668303
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.4139/sfj.53.65 
https://dx.doi.org/10.4139/sfj.53.65
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