Smoothing of hydrazine reduced electroless nickel plating and its application for capping metal formation
- Author
- TASHIRO, Katsuhiko1 ; YAMAMOTO, Seiji1 ; WATANABE, Daijyu2 ; HONMA, Hideo2 ; KAWASHIMA, Satoshi3
[1] Graduate School of Engineering, Kanto Gakuin University, 1-50-1, Higashi-mutsuura, Kanazawa-ku, Yokohama-shi, Kanagawa 236-0085, Japan
[2] Faculty of Engineering, Kanto Gakuin University, 1-50-1, Higashi-mutsuura, Kanazawa-ku, Yokohama-shi, Kanagawa 236-0085, Japan
[3] R & D Dept., Meltex Inc., 2-3-1, Yoshino-cho, Saitama-shi, Saitama 330-0031, Japan - Source
Hyomen gijutsu. = Journal of the Surface Finishing Society of Japan. 2002, Vol 53, Num 1, pp 71-77 ; ref : 14 ref
- ISSN
- 0915-1869
- Scientific domain
- Metallurgy, welding
- Publisher
- Hyomen Gijutsu Kyokai, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Application Circuit ULSI Dépôt chimique Electronique Hydrazine Microstructure Nickel Nickelage Revêtement métallique Réducteur Traitement surface
- Keyword (en)
- Application ULSI circuit Chemical deposition Electronics Hydrazine Microstructure Nickel Nickel plating Metal coating Reducing agent Surface treatment
- Keyword (es)
- Aplicación Circuito ULSI Depósito químico Electrónica Hidracina Microestructura Niquel Niquelado Revestimiento metálico Reductor Tratamiento superficie
- Keyword (de)
- Anwendung Stromloses Beschichten Elektronik Mikrogefuege Nickel Vernickeln Metallischer Ueberzug Reduktionsmittel Oberflaechenbehandlung
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11C Production techniques / 001D11C06 Surface treatment / 001D11C06D Metallic coatings
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13668304
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.4139/sfj.53.71 
https://dx.doi.org/10.4139/sfj.53.71
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