Etude par XPS de couches de ZrN déposées par pulverisation réactive magnétron
- Other title
- XPS study of ZrN thin films deposited by magnetron reactive sputtering (en)
- Author
- DEL RE, M1 ; GOUTTEBARON, R1 ; DAUCHOT, J. P1 ; WAUTELET, M1 ; HECQ, M1
[1] Lab. de Chimie Inorganique et Analytique Univ. de Mons-Hainaut, Materia Nova, Av. Nicolas Copemic, 7000 Mons, Belgium - Source
Le Vide (1995). 2002, Vol 57, Num 304 ; 240, 347-355 [10 p.] ; ref : 10 ref
- ISSN
- 1266-0167
- Scientific domain
- Chemical engineering; Metallurgy, welding
- Publisher
- Société française du vide, Paris
- Publication country
- France
- Document type
- Article
- Language
- French
- Keyword (fr)
- Couche mince Dépôt physique phase vapeur Etude expérimentale Magnétron Pulvérisation réactive Spectrométrie photoélectron Zirconium nitrure
- Keyword (en)
- Thin films Physical vapor deposition Experimental study Magnetrons Reactive sputtering Photoelectron spectroscopy Zirconium nitrides
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15C Deposition by sputtering
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13687151
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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