Growth mechanism of Y123 film by MOD-TFA method
- Author
- HONJO, Tetsuji1 ; FUJI, Hiroshi1 ; NAKAMURA, Yuichi1 ; IZUMI, Teruo1 ; SHIOHARA, Yuh1 ; SHIBATA, Junko2 ; YAMAMOTO, Takahisa2 ; IKUHARA, Yuichi2 ; TERANISHI, Ryo3 ; YOSHIMURA, Masahiro3
[1] Superconductivity Research Laboratory, International Superconductivity Technology Center, Tokyo 135-0062, Japan
[2] Faculty of Engineering, The University of Tokyo, Tokyo 113-8656, Japan
[3] Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan - Source
Nippon Kinzoku Gakkaishi (1952). = Journal of the Japan Institute of Metals (1952). 2002, Vol 66, Num 3, pp 151-154 ; ref : 8 ref
- CODEN
- NIKGAV
- ISSN
- 0021-4876
- Scientific domain
- Metallurgy, welding
- Publisher
- Nippon Kinzoku Gakkai, Sendai
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Baryum oxyde Couche mince Cuprate Dépôt chimique phase vapeur Etude expérimentale Microscopie électronique transmission Mécanisme croissance Méthode MOVPE Yttrium oxyde
- Keyword (en)
- Barium oxides Thin films Cuprates CVD Experimental study Transmission electron microscopy Growth mechanism MOVPE method Yttrium oxides
- Keyword (es)
- Mecanismo crecimiento Método MOVPE
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13691990
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.2320/jinstmet1952.66.3_151 
https://dx.doi.org/10.2320/jinstmet1952.66.3_151
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