Effect of sintering control on shrinkage suppressor of Ni internal electrode paste film by MLC
- Author
- UEYAMA, Ryosuke1 ; UEYAMA, Tamotsu2 ; KOUMOTO, Kunihito3
[1] Daiken Chemical Industry Corporation Limited, 2-7-19, Hanaten-Nishi, Jyoto-ku, Osaka-shi 536-0011, Japan
[2] FM & PST Laboratory, 629-81, Numanoi, Oaza, Nasu-machi, Nasu-gun, Tochigi 329-3446, Japan
[3] Department of Applied Chemistry, Gradate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya-shi 464-8603, Japan - Source
Nippon seramikkusu kyokai gakujutsu ronbunshi. = Journal of the Ceramic Society of Japan (1988). 2002, Vol 110, Num 4, pp 329-332 ; ref : 7 ref
- CODEN
- YGKSA4
- ISSN
- 0914-5400
- Scientific domain
- Chemical industry parachemical industry
- Publisher
- Nippon seramikkusu kyokai, Tokyo
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Caractéristique électrique Condensateur céramique Frittage Matériau électrode Multicouche Procédé fabrication Retrait
- Keyword (en)
- Electrical characteristic Ceramic capacitor Sintering Electrode material Multiple layer Manufacturing process Shrinkage
- Keyword (es)
- Característica eléctrica Condensador cerámico Sinterización Material electrodo Capa múltiple Procedimiento fabricación Retiro
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F09 Dielectric, amorphous and glass solid devices
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13692019
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.2109/jcersj.110.329 
https://dx.doi.org/10.2109/jcersj.110.329
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