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The influence of counterface materials and humidity on the tribological behavior of arc ion plated TiN films

Author
YOON, Seog-Young1 ; KANG, Myung-Chang2 ; KWON, Sik-Chol3 ; KWANG HO KIM1
[1] School of Materials Science and Engineering, Pusan National University, Pusan 609-735, Korea, Republic of
[2] School of Mechanical Engineering, Pusan National University, Pusan 609-735, Korea, Republic of
[3] Surface Engineering Department, Korea Institute of Machinery & Materials, Changwon 641-010, Korea, Republic of
Source

Surface & coatings technology. 2002, Vol 157, Num 2-3, pp 144-150 ; ref : 19 ref

CODEN
SCTEEJ
ISSN
0257-8972
Scientific domain
General chemistry, physical chemistry; Metallurgy, welding
Publisher
Elsevier, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Acier Coefficient frottement Couche mince Etude expérimentale Humidité Microscopie électronique balayage Placage ionique Propriété mécanique Titane nitrure Tribologie Usure
Keyword (en)
Steels Friction factor Thin films Experimental study Humidity Scanning electron microscopy Ion plating Mechanical properties Titanium nitrides Tribology Wear
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H60 Physical properties of thin films, nonelectronic / 001B60H60B Mechanical and acoustical properties

Pacs
6860B Mechanical and acoustical properties

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13800553

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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