Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching
- Author
- MATSUI, N1 ; MASHIMO, K1 ; EGAMI, A1 ; KONISHI, A1 ; OKADA, O1 ; TSUKADA, T1
[1] Anelva Corporation, 5-8-1 Yotsuya, Fuchu, Tokyo 183-8508, Japan - Conference title
- Selected papers revised from the Proceedings of the Sixth International Symposium on Sputtering and Plasma Processes (ISSP 2001), 13-15 June 2001, Japan
- Conference name
- ISSP International Symposium on Sputtering and Plasma Processes (6 ; 2001-06-13)
- Author (monograph)
- KINBARA, A (Editor)1 ; HATA, Tomonobu (Editor)2 ; YOSHINO, Yukio (Editor)3 ; KUSANO, E (Editor)1
[1] Advances Materials Science Research and Development Center, Kanazawa Institute of Technology, 3-1 Yatsukaho, Matto, Ishikawa 924-0838, Japan
[2] Graduate School of Natural Science and Technology, Kanazawa University, Kodatsuno 2-40-20, Kanazawa 920-8667, Japan
[3] Murata Mfg. Co., Ltd, 2-26-10 Tenjin, Nagaokakyoshi, Kyoto 617-8555, Japan - Source
Vacuum. 2002, Vol 66, Num 3-4, pp 479-485 ; ref : 11 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Conference Paper
- Language
- English
- Keyword (fr)
- Alliage binaire Cinétique Cobalt alliage Dispositif effet tunnel Dispositif magnétorésistif Durcissement superficiel Etude expérimentale Fer alliage Fer Gravure plasma Gravure sélective Masque Mémoire accès direct Mémoire magnétique Nickel alliage Onde hélicon Traitement surface Alliage CoFe Alliage FeNi Co Fe Fe Ni Fe Métal transition alliage Métal transition
- Keyword (en)
- Binary alloys Kinetics Cobalt alloys Tunneling device Magnetoresistive devices Surface hardening Experimental study Iron alloys Iron Plasma etching Selective etching Masks Random-access storage Magnetic storage devices Nickel alloys Helicon waves Surface treatments Transition element alloys Transition elements
- Keyword (es)
- Dispositivo efecto túnel Grabado plasma Grabado selectivo
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 13829915
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0042-207X(02)00119-7 
https://dx.doi.org/10.1016/S0042-207X(02)00119-7
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