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Structure and mechanical properties of Ti/C multilayer films deposited by sputtering

Author
INOUE, Shozo1 ; NAGAI, Kenji1 ; NIIBE, Masahito2 ; KOTERAZAWA, Keiji1 ; IWASA, Mikio3
[1] Department of Mechanical and Intelligent Engineering, Faculty of Engineering, Himeji Institute of Technology, Himeji 671-2201, Japan
[2] Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, Ako-gun 678-1205 Ikeda 563-8577, Japan
[3] National Institute of Advanced Industrial Science and Technology, Kansai Center, Ikeda 563-8577, Japan
Source

Nippon Kinzoku Gakkaishi (1952). = Journal of the Japan Institute of Metals (1952). 2002, Vol 66, Num 7, pp 778-783 ; ref : 17 ref

CODEN
NIKGAV
ISSN
0021-4876
Scientific domain
Metallurgy, welding
Publisher
Nippon Kinzoku Gakkai, Sendai
Publication country
Japan
Document type
Article
Language
Japanese
Keyword (fr)
Carbone Couche mince Couche multimoléculaire Diffraction RX Dépôt physique phase vapeur Etude expérimentale Microscopie force atomique Microscopie électronique balayage Propriété mécanique Pulvérisation irradiation Titane
Keyword (en)
Carbon Thin films Multilayer XRD Physical vapor deposition Experimental study Atomic force microscopy Scanning electron microscopy Mechanical properties Sputtering Titanium
Keyword (es)
Capa multimolecular
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pacs
6855J Structure and morphology; thickness

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13870008

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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