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A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact

Author
KYU HO CHAE1 ; GUM JU SUN1 ; JIN KOO KANG1 ; TAEK HYEON KIM1
[1] Department of Applied Chemistry and The Polymer Science & Technology Research Center, Chonnam National University, Kwangju 500-757, Korea, Republic of
Source

Journal of applied polymer science. 2002, Vol 86, Num 5, pp 1172-1180 ; ref : 30 ref

CODEN
JAPNAB
ISSN
0021-8995
Scientific domain
Polymers, paint and wood industries
Publisher
Wiley, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Contraste Copolymérisation radicalaire Etude expérimentale Hydrosolubilité Méthacrylamide dérivé copolymère Photolithographie Photorésist Photosensibilité Préparation Résist négatif Réticulation photochimique Styrènesulfonate polymère Transposition Fries pH Méthacrylamide(N-4-hydroxyphényl) copolymère Méthacrylamide(N-phényl) copolymère
Keyword (en)
Contrast Radical copolymerization Experimental study Water solubility Methacrylamide derivative copolymer Photolithography Photoresist Photosensitivity Preparation Negative resist Photochemical crosslinking Styrenesulfonate polymer Fries rearrangement pH
Keyword (es)
Contraste Copolimerización radical Estudio experimental Hidrosolubilidad Metacrilamida derivado copolímero Fotolitografía Fotorresistencia Fotosensibilidad Preparación Resistencia negativa Fotorreticulación Estireno sulfonato polímero Transposición Fries pH
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D02 Preparation, kinetics, thermodynamics, mechanism and catalysts / 001D09D02E Polymers with particular properties

Discipline
Physical chemistry of polymers
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
13878209

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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