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Large deflection analysis of a pre-stressed annular plate with a rigid boss under axisymmetric loading

Author
SU, Y. H1 ; CHEN, K. S2 ; ROBERTS, D. C3 ; SPEARING, S. M4
[1] Department of Mechanical Engineering, State University of New York at Stony Brook, United States
[2] Department of Mechanical Engineering, National Cheng-Kung University, Tainan, Taiwan, Province of China
[3] Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA, United States
[4] Department of Aeronautics and Astronautics, Massachusetts Institute of Technology, Cambridge, MA, United States
Source

Journal of micromechanics and microengineering (Print). 2001, Vol 11, Num 6, pp 645-653 ; ref : 11 ref

ISSN
0960-1317
Scientific domain
Electronics; Mechanical engineering
Publisher
Institute of Physics, Bristol
Publication country
United Kingdom
Document type
Article
Language
English
Keyword (fr)
Charge axisymétrique Conception système Couche limite Dispositif microélectromécanique Dispositif électromécanique Déflexion Effet dimensionnel Flèche Grande déformation Intégration numérique Membrane Microusinage Miniaturisation Modélisation Plaque annulaire Propriété matériau Précontrainte Symétrie axiale
Keyword (en)
Axisymmetric load System design Boundary layer Microelectromechanical device Electromechanical device Deflection Size effect Deflection(deformation) High strain Numerical integration Membrane Micromachining Miniaturization Modeling Annular plate Properties of materials Prestress Axial symmetry
Keyword (es)
Carga axisimétrica Concepción sistema Capa límite Dispositivo microelectromecánico Dispositivo electromecánico Deflección Efecto dimensional Torcedura Gran deformación Integración numérica Membrana Micromaquinado Miniaturización Modelización Placa anular Propiedad material Pretensado Simetría axial
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F21 Micro- and nanoelectromechanical devices (mems/nems)

Pacs
8540H Lithography, masks and pattern transfer

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14076152

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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