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Effect of crystalline form of flame-retardant on blooming mechanism

Author
INATA, Hitoshi1 ; OHGI, Koji1 ; HIGASHI, Nobuhiko1 ; TAKEDA, Kunihiko2
[1] Tokuyama Research Laboratory, Tokuyama Corp., Harumi-cho, Tokuyama, Yamaguchi 745-0024, Japan
[2] Department of Materials Science, Shibaura Institute of Technology, Shibaura, Minato-ku, Tokyo 108-8548, Japan
Source

Kobunshi ronbunshu (Tokyo). = Japanese journal of polymer science and technology. 2001, Vol 58, Num 9, pp 462-471 ; ref : 15 ref

CODEN
KBRBA3
ISSN
0386-2186
Scientific domain
Polymers, paint and wood industries
Publisher
Tsukiji daisan nagaoka, Tokyo
Publication country
Japan
Document type
Article
Language
Japanese
Keyword (fr)
Antimoine oxyde Brome Composé organique Défaut surface EVA Efflorescence Etude expérimentale Feuille Formation défaut Mécanisme Mélange polymère Phénols Propène polymère Relation formulation propriété Retardateur flamme
Keyword (en)
Antimony oxide Bromine Organic compounds Surface defect EVA Efflorescence Experimental study Foil Defect formation Mechanism Polymer blends Phenols Propylene polymer Property formulation relationship Flame retardant
Keyword (es)
Antimonio óxido Bromo Compuesto orgánico Defecto superficie EVA Eflorescencia Estudio experimental Hoja Formación defecto Mecanismo Fenoles Propeno polímero Relación formulación propiedad Retardador llama
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A04 Machinery and processing / 001D10A04A Plastics / 001D10A04A2 Moulding / 001D10A04A2A Injection moulding

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14081071

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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