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Growth of faceted, ballas-like and nanocrystalline diamond films deposited in CH4/H2/Ar MPCVD

Author
YANG, Tien-Syh1 ; LAI, Jir-Yon1 ; CHENG, Chia-Liang2 ; WONG, Ming-Show1
[1] Department of Materials Science and Engineering, National Dong Hwa University, Hualien, Taiwan, Province of China
[2] Department of Physics, National Dong Hwa University, Hualien, Taiwan, Province of China
Source

Diamond and related materials. 2001, Vol 10, Num 12, pp 2161-2166 ; ref : 23 ref

ISSN
0925-9635
Scientific domain
Crystallography
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Keyword (fr)
Argon Cinétique Couche mince Cristallinité Croissance cristalline en phase vapeur Diamant Décharge hyperfréquence Dépôt chimique phase vapeur Etude expérimentale Microstructure Minéral synthétique Morphologie Mécanisme croissance Méthode PECVD Nanocristal Précurseur Relation fabrication structure C Non métal
Keyword (en)
Argon Kinetics Thin films Crystallinity Crystal growth from vapors Diamonds Microwave discharge CVD Experimental study Microstructure Synthetic mineral Morphology Growth mechanism PECVD Nanocrystal Precursor Fabrication structure relation Nonmetals
Keyword (es)
Cristalinidad Descarga hiperfrecuencia Mineral sintético Mecanismo crecimiento Nanocristal Relación fabricación estructura
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)

Pacs
8115G Chemical vapor deposition (including plasma-enhanced CVD, MOCVD, etc.)

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14084117

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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