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Surface morphology and crystallographic orientation of electrodeposited Fe film

Author
INOUE, Koichiro1 2 ; NAKATA, Takeshi1 ; WATANABE, Tohru2
[1] Department of Material Engineering, Faculty of Engineering, Shibaura Institute of Technology, Tokyo 108-8548, Japan
[2] Department of Applied Chemistry, Graduate School of Engineering, Tokyo Metropolitan University, Tokyo 192-0397, Japan
Source

Nippon Kinzoku Gakkaishi (1952). = Journal of the Japan Institute of Metals (1952). 2001, Vol 65, Num 4, pp 229-235 ; ref : 16 ref

CODEN
NIKGAV
ISSN
0021-4876
Scientific domain
Metallurgy, welding
Publisher
Nippon Kinzoku Gakkai, Sendai
Publication country
Japan
Document type
Article
Language
Japanese
Keyword (fr)
Chlorure Couche mince Diffraction RX Dépôt électrolytique Etude expérimentale Fer Microscopie électronique balayage Morphologie Orientation cristalline Structure cristalline Sulfamique acide Sulfate
Keyword (en)
Chlorides Thin films XRD Electrodeposition Experimental study Iron Scanning electron microscopy Morphology Crystal orientation Crystal structure Sulfamic acid Sulfates
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
6855J Structure and morphology; thickness

Discipline
Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14110590

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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