The influence of Lewis acid/base chemistry on the removal of gallium by volatility from weapons-grade plutonium dissolved in molten chlorides
- Author
- WILLIAMS, David F1 ; DEL CUL, Guillermo D1 ; TOTH, Louis M2 ; COLLINS, Emory D3
[1] Oak Ridge National Laboratory, Chemical Technology Division, P.O. Box 2008, Oak Ridge, Tennessee 37831-6224, United States
[2] Electrochemical Systems, Knoxville, Tennessee 37922, United States
[3] Oak Ridge National Laboratory, Chemical Technology Division, P.O. Box 2008, Oak Ridge, Tennessee 37831-6181, United States - Source
Nuclear technology. 2001, Vol 136, Num 3, pp 367-370 ; ref : 9 ref
- CODEN
- NUTYBB
- ISSN
- 0029-5450
- Scientific domain
- Energy; Metallurgy, welding
- Publisher
- American Nuclear Society, La Grange Park, IL
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Acide Lewis Armement nucléaire Base Lewis Gallium alliage Gallium chlorure Plutonium alliage Plutonium Retraitement Sel fondu Volatilité
- Keyword (en)
- Lewis acid Nuclear weapon Lewis base Gallium alloy Gallium chloride Plutonium alloy Plutonium Reprocessing Molten salt Volatility
- Keyword (es)
- Acido Lewis Arma nuclear Base Lewis Galio aleación Galio cloruro Plutonio aleación Plutonio Reprocesamiento Sal fundida Volatibilidad
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06B Fuels / 001D06B04 Nuclear fuels / 001D06B04C Preparation and processing of nuclear fuels
- Discipline
- Energy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 14117853
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.13182/NT01-A3252 
https://dx.doi.org/10.13182/NT01-A3252
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