Effects of processing conditions on structure of TiN films deposited by arc ion plating
- Author
- MATSUE, Tatsuya1 ; HANABUSA, Takao2 ; IKEUCHI, Yasukazu1
[1] Dept. of Mat. Eng., Niihama National College of Tech., Yagumo-cho, Niihama, 792-8580, Japan
[2] Dept. of Mech. Eng., Tokushima Univ., Minami-josanjima-cho, Tokushima, 770-8506, Japan - Source
Zairyo. 2001, Vol 50, Num 7, pp 707-712 ; ref : 12 ref
- CODEN
- ZARYAQ
- ISSN
- 0514-5163
- Scientific domain
- Chemical industry parachemical industry; Metallurgy, welding; Polymers, paint and wood industries
- Publisher
- Society of Materials Science, Kyoto
- Publication country
- Japan
- Document type
- Article
- Language
- Japanese
- Keyword (fr)
- Arc électrique Couche mince Croissance cristalline en phase vapeur Etude expérimentale Mode opératoire Orientation cristalline Orientation préférentielle Placage ionique Relation fabrication structure Titane nitrure N Ti TiN Composé minéral Métal transition composé
- Keyword (en)
- Electric arcs Thin films Crystal growth from vapors Experimental study Operating mode Crystal orientation Preferred orientation Ion plating Fabrication structure relation Titanium nitrides Inorganic compounds Transition element compounds
- Keyword (es)
- Método operatorio Orientación preferencial Relación fabricación estructura
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15J Ion and electron beam-assisted deposition; ion plating
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 14120685
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.2472/jsms.50.707 
https://dx.doi.org/10.2472/jsms.50.707
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:19:\"10.2472\/jsms.50.707\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:9:\"\u0000*\u0000jtitle\";s:6:\"Zairyo\";s:9:\"\u0000*\u0000stitle\";s:6:\"Zairyo\";s:7:\"\u0000*\u0000date\";s:4:\"2001\";s:9:\"\u0000*\u0000volume\";s:2:\"50\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:3:\"707\";s:8:\"\u0000*\u0000epage\";s:3:\"712\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0514-5163\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"MATSUE\";s:10:\"\u0000*\u0000aufirst\";s:7:\"Tatsuya\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:15:\"HANABUSA, Takao\";i:1;s:17:\"IKEUCHI, Yasukazu\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ZARYAQ\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:8:\"\u0000*\u0000place\";s:5:\"Kyoto\";s:6:\"\u0000*\u0000pub\";s:28:\"Society of Materials Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:19:\"10.2472\/jsms.50.707\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:9:\"\u0000*\u0000jtitle\";s:6:\"Zairyo\";s:9:\"\u0000*\u0000stitle\";s:6:\"Zairyo\";s:7:\"\u0000*\u0000date\";s:4:\"2001\";s:9:\"\u0000*\u0000volume\";s:2:\"50\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:3:\"707\";s:8:\"\u0000*\u0000epage\";s:3:\"712\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0514-5163\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"MATSUE\";s:10:\"\u0000*\u0000aufirst\";s:7:\"Tatsuya\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:15:\"HANABUSA, Takao\";i:1;s:17:\"IKEUCHI, Yasukazu\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ZARYAQ\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:8:\"\u0000*\u0000place\";s:5:\"Kyoto\";s:6:\"\u0000*\u0000pub\";s:28:\"Society of Materials Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:19:\"10.2472\/jsms.50.707\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:19:\"10.2472\/jsms.50.707\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:9:\"\u0000*\u0000jtitle\";s:6:\"Zairyo\";s:9:\"\u0000*\u0000stitle\";s:6:\"Zairyo\";s:7:\"\u0000*\u0000date\";s:4:\"2001\";s:9:\"\u0000*\u0000volume\";s:2:\"50\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:3:\"707\";s:8:\"\u0000*\u0000epage\";s:3:\"712\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0514-5163\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"MATSUE\";s:10:\"\u0000*\u0000aufirst\";s:7:\"Tatsuya\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:15:\"HANABUSA, Takao\";i:1;s:17:\"IKEUCHI, Yasukazu\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ZARYAQ\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:8:\"\u0000*\u0000place\";s:5:\"Kyoto\";s:6:\"\u0000*\u0000pub\";s:28:\"Society of Materials Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:19:\"10.2472\/jsms.50.707\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:9:\"\u0000*\u0000jtitle\";s:6:\"Zairyo\";s:9:\"\u0000*\u0000stitle\";s:6:\"Zairyo\";s:7:\"\u0000*\u0000date\";s:4:\"2001\";s:9:\"\u0000*\u0000volume\";s:2:\"50\";s:8:\"\u0000*\u0000issue\";s:1:\"7\";s:8:\"\u0000*\u0000spage\";s:3:\"707\";s:8:\"\u0000*\u0000epage\";s:3:\"712\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0514-5163\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:6:\"MATSUE\";s:10:\"\u0000*\u0000aufirst\";s:7:\"Tatsuya\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:2:{i:0;s:15:\"HANABUSA, Takao\";i:1;s:17:\"IKEUCHI, Yasukazu\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"ZARYAQ\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:87:\"Effects of processing conditions on structure of TiN films deposited by arc ion plating\";s:8:\"\u0000*\u0000place\";s:5:\"Kyoto\";s:6:\"\u0000*\u0000pub\";s:28:\"Society of Materials Science\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:0:\"\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
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