Thin film sputtered silicon for silicon wafer bonding applications
- Author
- HURLEY, R. E1 ; GAMBLE, H. S1
[1] Northern Ireland Semiconductor Research Centre, School of Electrical & Electronic Engineering, The Queen's University of Belfast, Belfast BT9 5AH, United Kingdom - Conference title
- The international symposium on ion implantation and other applications of ions and electrons - ION 2002, 10-13 June 2002, Kazimierz Dolny, Poland
- Conference name
- International Symposium on Ion Implantation and Other Applications of Ions and Electrons - ION 2002 (Kazimierz Dolny 2002-06-10)
- Author (monograph)
- MICHALAK, Leszek (Editor)1 ; MACZKA, Dariusz (Editor)1 ; ZUK, Jerzy (Editor)1
[1] Institute of Physics, Maria Curie-Sklodowska University, Pl Marii Curii Curie-Sklodowskiej 1, Lubin 20-031, Poland - Source
Vacuum. 2003, Vol 70, Num 2-3, pp 131-140, 10 p ; ref : 32 ref
- CODEN
- VACUAV
- ISSN
- 0042-207X
- Scientific domain
- Metallurgy, welding; Physics
- Publisher
- Elsevier, Oxford
- Publication country
- United Kingdom
- Document type
- Conference Paper
- Language
- English
- Author keyword
- Low temperature bonding Silicon Smart-cut Soi Sputter Thin film
- Keyword (fr)
- Délaminage Fabrication microélectronique Fixation pastille Pulvérisation cathodique Pulvérisation haute fréquence Recuit Technologie silicium sur isolant
- Keyword (en)
- Delamination Microelectronic fabrication Wafer bonding Cathodic sputtering Radiofrequency sputtering Annealing Silicon on insulator technology
- Keyword (es)
- Delaminación Fabricación microeléctrica Fijación pastilla Pulverización catódica Pulverización alta frecuencia Recocido Tecnología silicio sobre aislante
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)
- Discipline
- Electronics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 14664643
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0042-207X(02)00631-0 
https://dx.doi.org/10.1016/S0042-207X(02)00631-0
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