Pascal and Francis Bibliographic Databases

Help

Permanent link : http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=14668348

Export

Selection :

A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering

Author
CHO JUI TAY1 ; QUAN, Chenggen1
[1] Department of Mechanical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260, Singapore
Source

Optik (Stuttgart). 2003, Vol 114, Num 1, pp 1-6, 6 p ; ref : 18 ref

CODEN
OTIKAJ
ISSN
0030-4026
Scientific domain
Optics
Publisher
Elsevier, Jena
Publication country
Germany
Document type
Article
Language
English
Keyword (fr)
Diffusion onde électromagnétique Etude expérimentale Etude théorique Faisceau laser Mesure rugosité Méthode mesure Pastille électronique Profilométrie Semiconducteur
Keyword (en)
Electromagnetic wave scattering Experimental study Theoretical study Laser beams Roughness measurement Measuring methods Wafers Profilometry Semiconductor materials
Keyword (es)
Medición rugosidad Perfilometría
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G60 Optical instruments, equipment and techniques

Pascal
001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B62 Biological and medical applications / 001B40B62E Metrological applications

Pacs
0760 Optical instruments, equipment, and techniques

Pacs
4262E Metrological applications

Discipline
Metrology Physics : optics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
14668348

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Access to the document

Searching the Web