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A technique for producing ordered arrays of metallic nanoclusters by electroless deposition in focused ion beam patterns

Author
WELLER, Robert A1 ; RYLE, Wesley T2 ; NEWTON, Allen T3 ; MCMAHON, Matthew D4 ; MILLER, Timothy M5 ; MAGRUDER, Robert H6
[1] Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, TN 37235, United States
[2] Western Kentucky University, Bowling Green, KY 42101, United States
[3] Department of Biomedical Engineering, Vanderbilt University, Nashville, TN 37235, United States
[4] Department of Physics, Vanderbilt University, Nashville, TN 37235, United States
[5] Department of Mechanical Engineering, Vanderbilt University, Nashville, TN 37235, United States
[6] Physics Department, Belmont University, Nashville, TN 37212, United States
Source

IEEE transactions on nanotechnology. 2003, Vol 2, Num 3, pp 154-157, 4 p ; ref : 17 ref

ISSN
1536-125X
Scientific domain
Electronics; Nanotechnologies, nanostructures, nanoobjects; Optics
Publisher
Institute of Electrical and Electronics Engineers, New York, NY
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Composé organique Dépôt par oxydoréduction Formation motif Nanomatériau Nanotechnologie Plasmon surface Procédé fabrication Technologie faisceau ion focalisé 8107
Keyword (en)
Organic compounds Electroless deposition Patterning Nanostructured materials Nanotechnology Surface plasmons Manufacturing processes Focused ion beam technology
Keyword (es)
Formacíon motivo
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A07 Nanoscale materials and structures: fabrication and characterization

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
15115524

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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