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Direct patterning of polymer-based photo luminescent structures with a mask

Author
JUAN PENG1 ; YANCHUN HAN1 ; YUMING YANG1 ; BINYAO LI1
[1] State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
Source

Thin solid films. 2004, Vol 450, Num 2, pp 329-333, 5 p ; ref : 23 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Author keyword
Atomic force microscopy Optical properties Patterning Thin polymer film
Keyword (fr)
Etude expérimentale Formation motif Microscopie force atomique Méthacrylate de méthyle polymère Photoluminescence Quinoléine Composé organique
Keyword (en)
Experimental study Patterning Atomic force microscopy PMMA Photoluminescence Quinolines Organic compounds
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H55 Photoluminescence / 001B70H55K Solid organic materials

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F15 Optoelectronic devices

Pacs
7855K Solid organic materials

Pacs
8560J Light-emitting devices

Discipline
Electronics Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
15590744

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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