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Structure of thin CrSi2 films on Si(0 0 1)

Author
FILONENKO, O1 ; FALKE, M1 ; HORTENBACH, H1 ; HENNING, A1 ; BEDDIES, G1 ; HINNEBERG, H.-J1
[1] Institute of Physics, Chemnitz University of Technology, 09107 Chemnitz, Germany
Source

Applied surface science. 2004, Vol 227, Num 1-4, pp 341-348, 8 p ; ref : 14 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Chromium MBE Silicides Template
Keyword (fr)
Chrome Codépôt Couche mince Croissance film Diffraction RX Epaisseur Epitaxie jet moléculaire Grosseur grain Microscopie électronique balayage Microscopie électronique transmission Métal transition Orientation préférentielle Silicium Texture Ultravide Cr Si
Keyword (en)
Chromium Codeposition Thin films Film growth XRD Thickness Molecular beam epitaxy Grain size Scanning electron microscopy Transmission electron microscopy Transition elements Preferred orientation Silicon Texture Ultrahigh vacuum
Keyword (es)
Codeposición Orientación preferencial
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
15608273

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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