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Sub-100 nm triangular nanopores fabricated with the reactive ion etching variant of nanosphere lithography and angle-resolved nanosphere lithography

Author
WHITNEY, Alyson V1 ; MYERS, Benjamin D2 ; VAN DUYNE, Richard P1
[1] Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208-3113, United States
[2] Department of Materials Science and Engineering, Northwestern University, 2220 Campus Drive, Evanston, Illinois 60208, United States
Source

Nano letters (Print). 2004, Vol 4, Num 8, pp 1507-1511, 5 p ; ref : 24 ref

ISSN
1530-6984
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Etude expérimentale Gravure ionique réactive Lithographie Matériau poreux Microscopie force atomique Nanolithographie Nanopore Substrat Si
Keyword (en)
Experimental study Reactive ion etching Lithography Porous materials Atomic force microscopy Nanolithography Nanopore
Keyword (es)
Grabado iónico reactivo
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16N Nanolithography

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pacs
8165C Surface cleaning, etching, patterning

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16001938

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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