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UV and RIR matrix assisted pulsed laser deposition of organic MEH-PPV films

Author
TOFTMANN, B1 ; PAPANTONAKIS, M. R2 ; AUYEUNG, R. C. Y3 ; KIM, W4 ; O'MALLEY, S. M5 ; BUBB, D. M5 ; HORWITZ, J. S3 ; SCHOU, J1 ; JOHANSEN, P. M1 ; HAGLUND, R. F2
[1] Department of Optics and Fluid Dynamics, Risø National Laboratory, 4000 Roskilde, Denmark
[2] Department of Physics and Astronomy and W.M. Keck Foundation Free-Electron Laser Laboratory, Vanderbilt University, Nashville, TN 37235, United States
[3] Surface Modification Branch, Naval Research Laboratory, Washington, DC 20375, United States
[4] Optical Sciences Division, Naval Research Laboratory, Washington, DC 20375, United States
[5] Department of Physics, Seton Hall University, South Orange, NJ 07079, United States
Conference title
Proceedings of Symposium H on Photonic Processing of Surfaces, Thin Films & Devices, of the EMRS 2003 Spring Conference, Strasbourg, France, June 10-11, 2003
Conference name
Symposium H on Photonic Processing of Surfaces, Thin Films & Devices, of the EMRS 2003 Spring Conference (Strasbourg 2003-06-10)
Author (monograph)
LIPPERT, Thomas K (Editor)1 ; BOYD, Ian W (Editor)2 ; CHRISEY, Douglas B (Editor)3 ; MILLON, Eric (Editor)4
European Materials Research Society, Strasbourg, France (Funder/Sponsor)
[1] Materials Group, Paul Scherrer Institut, 5232 Villigen PSI, Switzerland
[2] Chair of Electronic Materials, Electronic and Electrical Engineering, University College London, Torrington Place, London WC1E 7JE, United Kingdom
[3] Code 6372, Plasma Processing Section, 4555 Overlook Ave., S.W., Naval Research Laboratory, Washington, DC 20375-5345, United States
[4] Universite de Metz, LSMCL, Institut de Physique et de Chimie, 1 Bd Arago, Technopole Metz 2000, 57078 Metz, France
Source

Thin solid films. 2004, Vol 453-54, pp 177-181, 5 p ; ref : 13 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Conference Paper
Language
English
Author keyword
Laser deposition MEH-PPV Matrix assisted pulsed laser evaporation Pulsed laser deposition RIR UV
Keyword (fr)
Absorbance Couche mince Croissance cristalline en phase vapeur Effet physique rayonnement Etude expérimentale Laser pulsé Morphologie Méthode ablation laser Photoluminescence Phénylène dérivé polymère Rugosité Spectre IR Spectre UV visible Spectre transformée Fourier Vinylique dérivé polymère Substrat NaCl Substrat SiO2 Composé organique
Keyword (en)
Absorbance Thin films Crystal growth from vapors Physical radiation effects Experimental study Pulsed lasers Morphology Laser ablation technique Photoluminescence Phenylene derivative polymer Roughness Infrared spectra Ultraviolet visible spectrum Fourier transform spectra Polyvinyls Organic compounds
Keyword (es)
Absorbancia Fenileno derivado polímero Espectro UV visible
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties / 001B70H Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation / 001B70H55 Photoluminescence / 001B70H55K Solid organic materials

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15F Laser deposition

Pacs
7855K Solid organic materials

Pacs
8115F Laser deposition

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16024001

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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