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Modification of the Preston equation for the chemical-mechanical polishing of copper

Author
LUO, Q1 ; RAMARAJAN, S1 ; BABU, S. V1
[1] Department of Chemical Engineering and Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699, United States
Source

Thin solid films. 1998, Vol 335, Num 1-2, pp 160-167 ; ref : 33 ref

CODEN
THSFAP
ISSN
0040-6090
Scientific domain
Crystallography; Electronics; Metallurgy, welding; Condensed state physics
Publisher
Elsevier Science, Lausanne
Publication country
Switzerland
Document type
Article
Language
English
Keyword (fr)
Cuivre Etude théorique Milieu acide Milieu basique Polissage chimique Polissage mécanique Traitement surface Métal transition
Keyword (en)
Copper Theoretical study Acid medium Basic medium Chemical polishing Mechanical polishing Surface treatments Transition elements
Keyword (es)
Medio ácido Medio básico
Keyword (de)
Saures Medium Alkalisches Medium
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy

Pacs
8165P Polishing

Discipline
Metals. Metallurgy Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
1609413

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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