Modification of the Preston equation for the chemical-mechanical polishing of copper
- Author
- LUO, Q1 ; RAMARAJAN, S1 ; BABU, S. V1
[1] Department of Chemical Engineering and Center for Advanced Materials Processing, Clarkson University, Potsdam, NY 13699, United States - Source
Thin solid films. 1998, Vol 335, Num 1-2, pp 160-167 ; ref : 33 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Cuivre Etude théorique Milieu acide Milieu basique Polissage chimique Polissage mécanique Traitement surface Métal transition
- Keyword (en)
- Copper Theoretical study Acid medium Basic medium Chemical polishing Mechanical polishing Surface treatments Transition elements
- Keyword (es)
- Medio ácido Medio básico
- Keyword (de)
- Saures Medium Alkalisches Medium
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Metals. Metallurgy Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1609413
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/S0040-6090(98)00896-7 
https://dx.doi.org/10.1016/S0040-6090(98)00896-7
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