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Structure and scintillation properties of CsI(Tl) epitaxial layers

Author
ANANENKO, A1 ; FEDOROV, A1 ; MATEYCHENKO, P1 ; TARASOV, V1 ; VIDAJ, Yu1
[1] Institute for Scintillation Materials, Lenin Avenue, 61001 Kharkov, Ukraine
Source

Applied surface science. 2004, Vol 236, Num 1-4, pp 186-191, 6 p ; ref : 7 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
68.55.Jk A1. Crystal structure A3. Vapor phase epitaxy B2. Scintillator materials
Keyword (fr)
Composé minéral Couche épitaxique Croissance film Diffraction RX Dépôt sous vide Epitaxie phase vapeur Lithium fluorure Microscopie électronique balayage Structure cristalline F Li LiF
Keyword (en)
Inorganic compounds Epitaxial layers Film growth XRD Vacuum deposition VPE Lithium fluorides Scanning electron microscopy Crystal structure
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B70 Condensed matter: electronic structure, electrical, magnetic, and optical properties

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology

Discipline
Physics and materials science Physics of condensed state : electronic structure, electrical, magnetic and optical properties Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16100760

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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