Semiconducting properties of passive films formed on stainless steels : Influence of the alloying elements
- Author
- HAKIKI, N. E1 ; DA CUNHA BELO, M1 ; SIMOES, A. M. P2 ; FERREIRA, M. G. S2
[1] Centre d'Etudes de Chimie Métallurgique du CNRS, 94407 Vitry-Sur-Seine, France
[2] Departamento de Engenharia Química, Instituto Superior Técnico, 1096 Lisboa, Portugal - Source
Journal of the Electrochemical Society. 1998, Vol 145, Num 11, pp 3821-3829 ; ref : 43 ref
- CODEN
- JESOAN
- ISSN
- 0013-4651
- Scientific domain
- General chemistry, physical chemistry; Crystallography; Electrical engineering; Condensed state physics
- Publisher
- Electrochemical Society, Pennington, NJ
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Acier inoxydable 304 Acier inoxydable 316 Acier inoxydable austénitique Borate Capacité électrique Couche oxyde Passivation Photoélectrochimie Semiconducteur Solution tampon Acier Cr17Ni12Mo3 Acier Cr19Ni10
- Keyword (en)
- Stainless steel-304 Stainless steel-316 Austenitic stainless steel Borates Capacitance Oxide layer Passivation Photoelectrochemistry Semiconductor materials Buffer solution
- Keyword (es)
- Acero inoxidable austenítico Borato Capacitancia Capa óxido Pasivación Fotoelectroquímica Semiconductor(material) Solución de amortiguación
- Keyword (de)
- Austenitischer nichtrostender Stahl Borat Oxidschicht Passivierung Halbleiter
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D11 Metals. Metallurgy / 001D11E Corrosion / 001D11E01 Corrosion mechanisms
- Discipline
- Metals. Metallurgy
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 1611352
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1149/1.1838880 
https://dx.doi.org/10.1149/1.1838880
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