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Suppression of photo-induced dilation in cyanide treated hydrogenated amorphous silicon films

Author
SOBAJIMA, Yasushi1 ; MORI, Kunihiro1 ; TSUKAMOTO, Masahiro1 ; YOSHIDA, Norimitsu1 ; TAKAHASHI, Masao2 ; KOBAYASHI, Hikaru2 ; NONOMURA, Shuichi1
[1] Environmental and Renewable Energy Systems Division, Graduate School of Engineering, Gifu University, 1-1 Yanagido, Gifu 501-1193, Japan
[2] Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
Source

Solar energy materials and solar cells. 2005, Vol 85, Num 2, pp 177-187, 11 p ; ref : 18 ref

ISSN
0927-0248
Scientific domain
General chemistry, physical chemistry; Energy
Publisher
Elsevier, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
Amorphous silicon Cyanide treatment Photoinduced dilation
Keyword (fr)
Cellule solaire silicium Cyanure Energie solaire Recuit thermique Silicium Spectrométrie photoélectron
Keyword (en)
Silicon solar cells Cyanides Solar energy Thermal annealing Silicon Photoelectron spectrometry
Keyword (es)
Cianuro Energía solar Recocido térmico Silicio Espectrometría fotoelectrón
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D06 Energy / 001D06C Natural energy / 001D06C02 Solar energy / 001D06C02D Photovoltaic conversion / 001D06C02D1 Solar cells. Photoelectrochemical cells

Discipline
Energy
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16279825

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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