Observation of femtosecond laser-induced ablation in crystalline silicon
- Author
- CHOI, Tae Y1 ; GRIGOROPOULOS, Costas P2
[1] Institute of Energy Technology, Swiss Federal Institute of Technology Zurich, Zurich 8092, Switzerland
[2] Department of Mechanical Engineering, University of California, Berkeley, Berkeley, CA 94720-1740, United States - Source
Journal of heat transfer. 2004, Vol 126, Num 5, pp 723-726, 4 p ; ref : 29 ref
- Publisher
- American Society of Mechanical Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Domaine temps fs Etude expérimentale Impulsion ultracourte Microscopie optique Méthode ablation laser Plasma Résolution temporelle Silicium Méthode pompe sonde
- Keyword (en)
- fs range Experimental study Ultrashort pulse Optical microscopy Laser ablation technique Plasma Time resolution Silicon
- Keyword (es)
- Impulsión ultracorto
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B40 Fundamental areas of phenomenology (including applications) / 001B40B Optics / 001B40B62 Biological and medical applications / 001B40B62C Industrial applications
- Discipline
- Physics : optics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16322943
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1115/1.1795224 
https://dx.doi.org/10.1115/1.1795224
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