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Surface-constrained foaming of polymer thin films with supercritical carbon dioxide

Author
SIRIPURAPU, Srinivas1 ; COUGHLAN, John A1 ; SPONTAK, Richard J1 2 ; KHAN, Saad A1
[1] Department of Chemical & Biomolecular Engineering, North Carolina State University, Raleigh, North Carolina 27695, United States
[2] Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina 27695, United States
Source

Macromolecules. 2004, Vol 37, Num 26, pp 9872-9879, 8 p ; ref : 42 ref

CODEN
MAMOBX
ISSN
0024-9297
Scientific domain
Polymers, paint and wood industries
Publisher
American Chemical Society, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Alvéolaire Carbone dioxyde Effet pression Etude expérimentale Film Modélisation Morphologie Méthacrylate de méthyle polymère Procédé expansion Relation mise en oeuvre structure Solvant supercritique Structure cellulaire Séparation phase Temps exposition
Keyword (en)
Foam(plastics) Carbon dioxide Pressure effect Experimental study Film Modeling Morphology Methyl methacrylate polymer Foaming process Structure processing relationship Supercritical solvent Cell structure Phase separation Exposure time
Keyword (es)
Alveolar Carbono dióxido Efecto presión Estudio experimental Película Modelización Morfología Metacrilato de metilo polímero Procedimiento expansión Relación puesta en marcha estructura Disolvente supercrítico Estructura celular Separación fase Tiempo exposición
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D10 Polymer industry, paints, wood / 001D10A Technology of polymers / 001D10A06 Forms of application and semi-finished materials / 001D10A06A Cellular

Discipline
Polymer industry, paints, wood
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16362173

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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