Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium
- Author
- LIAO, J. X1 ; XIA, L. F2 ; SUN, M. R2 ; LIU, W. M3 ; XU, T3 ; YANG, C. R1 ; CHEN, H. W1 ; FU, C. L1 ; LENG, W. J1
[1] School of Microelectronics and Solid-State Electronics, University of Electronic Science and Technology of China, ChengDu 610054, China
[2] School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China
[3] State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, China - Source
Applied surface science. 2005, Vol 240, Num 1-4, pp 71-76, 6 p ; ref : 22 ref
- Publisher
- Elsevier Science, Amsterdam
- Publication country
- Netherlands
- Document type
- Article
- Language
- English
- Author keyword
- Interlayer Plasma-based ion implantation Sputtering current
- Keyword (fr)
- Addition azote Addition titane Alliage base aluminium Composition surface Couche intermédiaire Courant critique Diffraction RX Implantation ion Pulvérisation irradiation Spectre photoélectron RX Structure surface Traitement par plasma
- Keyword (en)
- Nitrogen additions Titanium additions Aluminium base alloys Surface composition Interlayers Critical current XRD Ion implantation Sputtering X-ray photoelectron spectra Surface structure Plasma assisted processing
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55L Defects and impurities: doping, implantation, distribution, concentration, etc
- Discipline
- Metals. Metallurgy Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16416342
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.apsusc.2004.06.145 
https://dx.doi.org/10.1016/j.apsusc.2004.06.145
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