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Sub-micron scale patterning using femtosecond laser and self-assembled monolayers interaction

Author
CHANG, Wonseok1 ; CHOI, Moojin1 ; KIM, Jaegu1 ; CHO, Sunghak1 ; WHANG, Kyunghyun1
[1] Nanoprocess Group, Korea Institute of Machinery and Materials, 171 Jang-dong, Yusong-gu, Daejeon 305-343, Korea, Republic of
Source

Applied surface science. 2005, Vol 240, Num 1-4, pp 296-304, 9 p ; ref : 15 ref

ISSN
0169-4332
Scientific domain
General chemistry, physical chemistry; Crystallography; Nanotechnologies, nanostructures, nanoobjects; Condensed state physics
Publisher
Elsevier Science, Amsterdam
Publication country
Netherlands
Document type
Article
Language
English
Author keyword
07.79.Fc Femtosecond laser patterning 81.16.Dn 81.16.Rf Photodecomposition Photooxidation Self-assembled monolayer
Keyword (fr)
Alcanethiol Couche autoassemblée Faisceau laser Formation motif Microscopie force atomique Nanostructure Photolithographie Photooxydation Photorésist Structure surface
Keyword (en)
Alkanethiol Self-assembled layers Laser beams Patterning Atomic force microscopy Nanostructures Photolithography Photooxidation Photoresists Surface structure
Keyword (es)
Alcanotiol Fotooxidación
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16D Self-assembly

Pascal
001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A16 Methods of nanofabrication / 001B80A16R Nanoscale pattern formation

Discipline
Physics and materials science
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16416368

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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