Sub-30 nm lithography with near-field scanning optical microscope combined with femtosecond laser
- Author
- LIN, Y1 2 ; HONG, M. H1 2 ; WANG, W. J1 ; LAW, Y. Z2 ; CHONG, T. C1 2
[1] Data Storage Institute, DSI Building, 5 Engineering Drive 1, 117608, Singapore, Singapore
[2] Department of Electrical and Computer Engineering, National University of Singapore, 1 Engineering Drive 3, Singapore 117576, Singapore - Source
Applied physics. A, Materials science & processing (Print). 2005, Vol 80, Num 3, pp 461-465, 5 p ; ref : 20 ref
- ISSN
- 0947-8396
- Scientific domain
- Electronics; Optics; Condensed state physics
- Publisher
- Springer, Berlin
- Publication country
- Germany
- Document type
- Article
- Language
- English
- Keyword (fr)
- Ecriture laser Lithographie Microscopie force atomique Microscopie optique champ proche Microscopie électronique balayage Photorésist
- Keyword (en)
- Laser writing Lithography Atomic force microscopy Near-field scanning optical microscopy Scanning electron microscopy Photoresists
- Keyword (es)
- Escritura láser
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16450114
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s00339-004-3093-0 
https://dx.doi.org/10.1007/s00339-004-3093-0
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