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Porous semiconductor chalcogenide aerogels

Author
MOHANAN, Jaya L1 ; ARACHCHIGE, Indika U1 ; BROCK, Stephanie L1
[1] Department of Chemistry, Wayne State University, Detroit, MI 48202, United States
Source

Science (Washington, D.C.). 2005, Vol 307, Num 5708, pp 397-400, 4 p

CODEN
SCIEAS
ISSN
0036-8075
Scientific domain
Multidisciplinary
Publisher
American Association for the Advancement of Science, Washington, DC
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Aérogel Cadmium Sulfure Carbone dioxyde Chalcogénure Matériau poreux Mésoporosité Nanoparticule Oxydation Photoluminescence Plomb Sulfure Propriété optique Préparation Réaction photochimique Semiconducteur Solvant supercritique Thiolate Xérogel Zinc Sulfure Métal transition Chalcogénure Métal transition Composé
Keyword (en)
Aerogel Cadmium Sulfides Carbon dioxide Chalcogenides Porous material Mesoporosity Nanoparticle Oxidation Photoluminescence Lead Sulfides Optical properties Preparation Photochemical reaction Semiconductor materials Supercritical solvent Thiolate Xerogel Zinc Sulfides Transition metal Chalcogenides Transition metal Compounds
Keyword (es)
Aerógel Cadmio Sulfuro Carbono dióxido Calcogenuro Material poroso Mesoporosidad Nanopartícula Oxidación Fotoluminiscencia Plomo Sulfuro Propiedad óptica Preparación Reacción fotoquímica Semiconductor(material) Disolvente supercrítico Tiolato Xerogel Zinc Sulfuro Metal transición Calcogenuro Metal transición Compuesto
Classification
Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state / 001C01J05 Colloidal gels. Colloidal sols

Pascal
001 Exact sciences and technology / 001C Chemistry / 001C01 General and physical chemistry / 001C01J Colloidal state and disperse state / 001C01J08 Porous materials

Discipline
General chemistry and physical chemistry
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16472178

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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