Space and time resolved rotational state populations and gas temperatures in an inductively coupled hydrogen RF discharge
- Author
- ABDEL-RAHMAN, M1 ; GANS, T2 ; SCHULZ-VON DER GATHEN, V1 ; DÖBELE, H. F1
[1] Institut für Laser-und Plasmaphysik, Universität Duisburg-Essen, Campus Essen, 45117 Essen, Germany
[2] Institut für Plasma-und Atomphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany - Source
Plasma sources science & technology (Print). 2005, Vol 14, Num 1, pp 51-60, 10 p ; ref : 19 ref
- ISSN
- 0963-0252
- Scientific domain
- Plasma physics
- Publisher
- Institute of Physics, Bristol
- Publication country
- United Kingdom
- Document type
- Article
- Language
- English
- Keyword (fr)
- Application industrielle Couplage capacitif Couplage inductif Diagnostic plasma Dispositif expérimental Décharge haute fréquence Emission optique Etude expérimentale Hydrogène Mesure température Plasma couplé inductivement Radiofréquence Résolution spatiale Résolution temporelle Spectrométrie émission Température plasma Température rotationnelle Traitement par plasma Traitement surface
- Keyword (en)
- Industrial application Capacitive coupling Inductive coupling Plasma diagnostics Experimental device High-frequency discharges Light emission Experimental study Hydrogen Temperature measurement Inductively coupled plasma Radiofrequency Spatial resolution Time resolution Emission spectroscopy Plasma temperature Rotational temperature Plasma assisted processing Surface treatments
- Keyword (es)
- Aplicación industrial Acoplamiento electrostático Acoplamiento inductivo Dispositivo experimental Emisión óptica Radiofrecuencia Temperatura rotacional
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B70 Plasma diagnostic techniques and instrumentation / 001B50B70K Optical (ultraviolet, visible, infrared) measurements
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B77 Plasma applications / 001B50B77B Etching and cleaning
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B80 Electric discharges / 001B50B80P High-frequency discharges
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B50 Physics of gases, plasmas and electric discharges / 001B50B Physics of plasmas and electric discharges / 001B50B80 Electric discharges / 001B50B80Y Discharges for spectral sources (including inductively coupled plasmas)
- Discipline
- Physics of gases, plasmas and electric discharges
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16531204
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1088/0963-0252/14/1/007 
https://dx.doi.org/10.1088/0963-0252/14/1/007
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