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Fabrication of sub-micron active layer SSOI substrates using ion splitting and wafer bonding technologies

Author
RUDDELL, F. H1 ; BAIN, M. F1 ; SUDER, S1 ; HURLEY, R. E1 ; ARMSTRONG, B. M1 ; FUSCO, V. F1 ; GAMBLE, H. S1
[1] Northern Ireland Semiconductor Research Centre, Queen's University Belfast, Ashby Building, Stranmillis Road, Belfast, Northern Ireland, BT9 5AH, United Kingdom
Conference title
Semiconductor wafer bonding VIi : science, technology, and applications (Paris, April - May 2003)
Conference name
Semiconductor wafer bonding. Conference (7 ; Paris 2003-04)
Author (monograph)
Bengtsson, S (Editor); Baumgart, H (Editor); Hunt, C.E (Editor); Suga, T (Editor)
Electrochemical Society, Electronics Division, Pennington NJ, United States (Organiser of meeting)
Source

Proceedings - Electrochemical Society. 2003, pp 25-30, 6 p ; ref : 6 ref

ISSN
0161-6374
ISBN
1-56677-402-0
Scientific domain
General chemistry, physical chemistry; Electronics; Electrical engineering; Energy; Physics
Publisher
Electrochemical Society, Pennington NJ
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Basse pression Cavité dans réseau Circuit actif Couche active Couche contrainte Couche enterrée Diélectrique Dépôt chimique phase vapeur Fabrication microélectronique Fixation pastille Formation image Gravure sélective Liaison matériau Microscope balayage Microscopie acoustique Pastille électronique Réflexion onde Région active Réseau diode Technologie silicium sur isolant
Keyword (en)
Low pressure Void Active circuit Active layer Strained layer Buried layer Dielectric materials Chemical vapor deposition Microelectronic fabrication Wafer bonding Imaging Selective etching Bonding Scanning microscope Acoustic microscopy Wafer Wave reflection Active region Diode array Silicon on insulator technology
Keyword (es)
Baja presión Cavidad en red Circuito activo Capa activa Capa forzada Capa enterrada Dieléctrico Depósito químico fase vapor Fabricación microeléctrica Fijación pastilla Formación imagen Grabado selectivo Microscopio barrido Microscopía acústica Pastilla electrónica Reflexión onda Región activa Red diodo Tecnología silicio sobre aislante
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16545643

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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