Pascal and Francis Bibliographic Databases

Help

Permanent link : http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16546835

Export

Selection :

Optimized nickel silicide process formation for high performance sub-65nm CMOS nodes

Author
FROMENT, B1 ; CARRON, V2 ; MORAND, Y; DESCOMBES, S; HALIMAOUI, A1 ; MULLER, M3 ; POUYDEBASQUE, A3 ; WACQUANT, F1 ; CECCARELLI, D1 ; DEJONGHE, V3
[1] ST Microelectronics, 850 rue Jean Monet, 38926 Crolles, France
[2] CEA-LETI, 17 rue des Martyrs, 38100 Grenoble, France
[3] Philips Semiconductor, Crolles, France
Conference title
Advanced short-time thermal processing for Si-based CMOS devices II (San Antonio TX, 10-12 May 2004)
Conference name
International symposium on advanced short-time thermal processing for si-based CMOS devices II (San Antonio TX 2004-05-10)
Author (monograph)
Öztürk, M.C (Editor); Chen, L.J (Editor); Timans, P.J (Editor); Roozeboom, F (Editor); Gusev, E.P (Editor); Kwong, D.L (Editor); Miner, G (Editor)
Electrochemical Society, Electronics Division, Pennington NJ, United States (Organiser of meeting)
Electrochemical Society, Dielectric Science and Technology Division, Pennington NJ, United States (Organiser of meeting)
Electrochemical Society, High Temperature Materials Division, Pennington NJ, United States (Organiser of meeting)
Source

Proceedings - Electrochemical Society. 2004, pp 191-201, 11 p ; ref : 5 ref

ISSN
0161-6374
ISBN
1-56677-406-3
Scientific domain
General chemistry, physical chemistry; Electronics; Electrical engineering; Energy; Physics
Publisher
Electrochemical Society, Pennington NJ
Publication country
United States
Document type
Conference Paper
Language
English
Keyword (fr)
Evaluation performance Fabrication microélectronique Gravure sélective Miniaturisation Optimisation Polycristal Recuit Technologie MOS complémentaire Technologie avancée
Keyword (en)
Performance evaluation Microelectronic fabrication Selective etching Miniaturization Optimization Polycrystal Annealing Complementary MOS technology Advanced technology
Keyword (es)
Evaluación prestación Fabricación microeléctrica Grabado selectivo Miniaturización Optimización Policristal Recocido Tecnología MOS complementario Tecnología avanzada
Classification
Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing

Pascal
001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F17 Microelectronic fabrication (materials and surfaces technology)

Discipline
Electronics
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16546835

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

Searching the Web