Electronic structure of CuWO4: XPS, XES and NEXAFS studies
- Author
- KHYZHUN, O. Yu1 ; STRUNSKUS, T2 ; CRAMM, S3 ; SOLONIN, Yu. M1
[1] Frantsevych Institute for Problems of Materials Science, National Academy of Sciences of Ukraine, 3 Krzhyzhanivsky str, 03142 Kiev, Ukraine
[2] Lehrstuhl für Physikalische Chemie I, Ruhr-Universität Bochum, Universitätsstrasse 150, 44801 Bochum, Germany
[3] IFF, Forschungszentrum Jülich, 52425 Jiilich, Germany - Source
Journal of alloys and compounds. 2005, Vol 389, pp 14-20, 7 p ; ref : 35 ref
- ISSN
- 0925-8388
- Scientific domain
- Inorganic chemistry; Crystallography; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- Copper tungstate Electronic structure NEXAFS Tungsten oxide XES XPS
- Keyword (fr)
- Charge effective Composé minéral Cuivre EXAFS Energie liaison Gravité Métal transition composé Métal transition Niveau coeur Niveau énergie Spectre RX Spectre photoélectron RX Spectre émission RX Structure électronique Tungstate Tungstène oxyde Valence XANES Cu O W W WO3
- Keyword (en)
- Effective charge Inorganic compounds Copper EXAFS Binding energy Gravity Transition element compounds Transition elements Core levels Energy levels X-ray spectra X-ray photoelectron spectra X-ray emission spectra Electronic structure Tungstates Tungsten oxides Valence XANES
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics
- Discipline
- Theoretical physics
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16551725
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.jallcom.2004.08.013 
https://dx.doi.org/10.1016/j.jallcom.2004.08.013
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