Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films
- Author
- SIVANIAH, E1 ; HAYASHI, Y1 ; MATSUBARA, S1 ; KIYONO, S1 ; HASHIMOTO, T1 ; FUKUNAGA, K2 ; KRAMER, E. J3 ; MATES, T3
[1] Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University, Katsura, Kyoto 615-8510, Japan
[2] UBE Industries, Ltd., 8-1 Goi-minamikaigan, Ichihara, Chiba 290-0045, Japan
[3] Materials Department, University of California at Santa Barbara, Santa Barbara, California 95801, United States - Source
Macromolecules. 2005, Vol 38, Num 5, pp 1837-1849, 13 p
- CODEN
- MAMOBX
- ISSN
- 0024-9297
- Scientific domain
- Polymers, paint and wood industries
- Publisher
- American Chemical Society, Washington, DC
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Copolymère biséquencé Couche ITO Couche mince Effet surface Etude expérimentale Imide polymère Microrugosité Molécule symétrique Méthacrylate de méthyle copolymère Orientation préférentielle Polymère aromatique Structure domaine Structure lamellaire Styrène copolymère Effet substrat Orientation lamellaire Substrat rugueux
- Keyword (en)
- Diblock copolymer ITO layers Thin film Surface effect Experimental study Polyimide Microroughness Symmetric molecule Methyl methacrylate copolymer Preferred orientation Aromatic polymer Domain structure Lamellar structure Styrene copolymer
- Keyword (es)
- Copolímero bisecuencia Capa fina Efecto superficie Estudio experimental Imida polímero Microrugosidad Molécula simétrica Metacrilato de metilo copolímero Orientación preferencial Polímero aromático Estructura dominio Estructura lamelar Estireno copolímero
- Classification
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D09 Physicochemistry of polymers / 001D09D Organic polymers / 001D09D04 Properties and characterization / 001D09D04K Structure, morphology and analysis
- Discipline
- Physical chemistry of polymers
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16599910
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
Access to the document
Install on your browser
DOI
10.1021/ma0482157 
https://dx.doi.org/10.1021/ma0482157
"O:13:\"PanistOpenUrl\":36:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000idc\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:9:\"\u0000*\u0000jtitle\";s:14:\"Macromolecules\";s:9:\"\u0000*\u0000stitle\";s:14:\"Macromolecules\";s:7:\"\u0000*\u0000date\";s:4:\"2005\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:4:\"1837\";s:8:\"\u0000*\u0000epage\";s:4:\"1849\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0024-9297\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"SIVANIAH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"E\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:10:\"HAYASHI, Y\";i:1;s:12:\"MATSUBARA, S\";i:2;s:9:\"KIYONO, S\";i:3;s:12:\"HASHIMOTO, T\";i:4;s:11:\"FUKUNAGA, K\";i:5;s:12:\"KRAMER, E. J\";i:6;s:8:\"MATES, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MAMOBX\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:8:\"\u0000*\u0000place\";s:14:\"Washington, DC\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"13\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Panist access
"O:12:\"IstexOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:9:\"\u0000*\u0000jtitle\";s:14:\"Macromolecules\";s:9:\"\u0000*\u0000stitle\";s:14:\"Macromolecules\";s:7:\"\u0000*\u0000date\";s:4:\"2005\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:4:\"1837\";s:8:\"\u0000*\u0000epage\";s:4:\"1849\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0024-9297\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"SIVANIAH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"E\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:10:\"HAYASHI, Y\";i:1;s:12:\"MATSUBARA, S\";i:2;s:9:\"KIYONO, S\";i:3;s:12:\"HASHIMOTO, T\";i:4;s:11:\"FUKUNAGA, K\";i:5;s:12:\"KRAMER, E. J\";i:6;s:8:\"MATES, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MAMOBX\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:8:\"\u0000*\u0000place\";s:14:\"Washington, DC\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"13\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Istex access
"O:16:\"UnpaywallOpenUrl\":35:{s:8:\"\u0000*\u0000email\";s:27:\"assistance-portail@inist.fr\";s:6:\"\u0000*\u0000fmt\";N;s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";N;s:7:\"\u0000*\u0000pmid\";N;s:9:\"\u0000*\u0000atitle\";N;s:9:\"\u0000*\u0000jtitle\";N;s:9:\"\u0000*\u0000stitle\";N;s:7:\"\u0000*\u0000date\";N;s:9:\"\u0000*\u0000volume\";N;s:8:\"\u0000*\u0000issue\";N;s:8:\"\u0000*\u0000spage\";N;s:8:\"\u0000*\u0000epage\";N;s:8:\"\u0000*\u0000pages\";N;s:7:\"\u0000*\u0000issn\";N;s:8:\"\u0000*\u0000eissn\";N;s:9:\"\u0000*\u0000aulast\";N;s:10:\"\u0000*\u0000aufirst\";N;s:9:\"\u0000*\u0000auinit\";N;s:10:\"\u0000*\u0000auinitm\";N;s:5:\"\u0000*\u0000au\";N;s:9:\"\u0000*\u0000aucorp\";N;s:7:\"\u0000*\u0000isbn\";N;s:8:\"\u0000*\u0000coden\";N;s:8:\"\u0000*\u0000genre\";N;s:7:\"\u0000*\u0000part\";N;s:9:\"\u0000*\u0000btitle\";N;s:8:\"\u0000*\u0000title\";N;s:8:\"\u0000*\u0000place\";N;s:6:\"\u0000*\u0000pub\";N;s:10:\"\u0000*\u0000edition\";N;s:9:\"\u0000*\u0000tpages\";N;s:9:\"\u0000*\u0000series\";N;s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";N;}"
Unpaywall access
"O:16:\"EuropePMCOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:9:\"\u0000*\u0000jtitle\";s:14:\"Macromolecules\";s:9:\"\u0000*\u0000stitle\";s:14:\"Macromolecules\";s:7:\"\u0000*\u0000date\";s:4:\"2005\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:4:\"1837\";s:8:\"\u0000*\u0000epage\";s:4:\"1849\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0024-9297\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"SIVANIAH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"E\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:10:\"HAYASHI, Y\";i:1;s:12:\"MATSUBARA, S\";i:2;s:9:\"KIYONO, S\";i:3;s:12:\"HASHIMOTO, T\";i:4;s:11:\"FUKUNAGA, K\";i:5;s:12:\"KRAMER, E. J\";i:6;s:8:\"MATES, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MAMOBX\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:8:\"\u0000*\u0000place\";s:14:\"Washington, DC\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"13\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Europe PubMed Central access
"O:11:\"BaseOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:9:\"\u0000*\u0000jtitle\";s:14:\"Macromolecules\";s:9:\"\u0000*\u0000stitle\";s:14:\"Macromolecules\";s:7:\"\u0000*\u0000date\";s:4:\"2005\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:4:\"1837\";s:8:\"\u0000*\u0000epage\";s:4:\"1849\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0024-9297\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"SIVANIAH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"E\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:10:\"HAYASHI, Y\";i:1;s:12:\"MATSUBARA, S\";i:2;s:9:\"KIYONO, S\";i:3;s:12:\"HASHIMOTO, T\";i:4;s:11:\"FUKUNAGA, K\";i:5;s:12:\"KRAMER, E. J\";i:6;s:8:\"MATES, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MAMOBX\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:8:\"\u0000*\u0000place\";s:14:\"Washington, DC\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"13\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
Base Search access
"O:12:\"ArXivOpenUrl\":35:{s:10:\"\u0000*\u0000openUrl\";N;s:6:\"\u0000*\u0000fmt\";s:7:\"journal\";s:6:\"\u0000*\u0000doi\";s:17:\"10.1021\/ma0482157\";s:6:\"\u0000*\u0000pii\";s:0:\"\";s:7:\"\u0000*\u0000pmid\";s:0:\"\";s:9:\"\u0000*\u0000atitle\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:9:\"\u0000*\u0000jtitle\";s:14:\"Macromolecules\";s:9:\"\u0000*\u0000stitle\";s:14:\"Macromolecules\";s:7:\"\u0000*\u0000date\";s:4:\"2005\";s:9:\"\u0000*\u0000volume\";s:2:\"38\";s:8:\"\u0000*\u0000issue\";s:1:\"5\";s:8:\"\u0000*\u0000spage\";s:4:\"1837\";s:8:\"\u0000*\u0000epage\";s:4:\"1849\";s:8:\"\u0000*\u0000pages\";s:0:\"\";s:7:\"\u0000*\u0000issn\";s:9:\"0024-9297\";s:8:\"\u0000*\u0000eissn\";s:0:\"\";s:9:\"\u0000*\u0000aulast\";s:8:\"SIVANIAH\";s:10:\"\u0000*\u0000aufirst\";s:1:\"E\";s:9:\"\u0000*\u0000auinit\";s:0:\"\";s:10:\"\u0000*\u0000auinitm\";s:0:\"\";s:5:\"\u0000*\u0000au\";a:7:{i:0;s:10:\"HAYASHI, Y\";i:1;s:12:\"MATSUBARA, S\";i:2;s:9:\"KIYONO, S\";i:3;s:12:\"HASHIMOTO, T\";i:4;s:11:\"FUKUNAGA, K\";i:5;s:12:\"KRAMER, E. J\";i:6;s:8:\"MATES, T\";}s:9:\"\u0000*\u0000aucorp\";s:0:\"\";s:7:\"\u0000*\u0000isbn\";s:0:\"\";s:8:\"\u0000*\u0000coden\";s:6:\"MAMOBX\";s:8:\"\u0000*\u0000genre\";s:7:\"article\";s:7:\"\u0000*\u0000part\";s:0:\"\";s:9:\"\u0000*\u0000btitle\";s:0:\"\";s:8:\"\u0000*\u0000title\";s:127:\"Symmetric diblock copolymer thin films on rough substrates. Kinetics and structure formation in pure block copolymer thin films\";s:8:\"\u0000*\u0000place\";s:14:\"Washington, DC\";s:6:\"\u0000*\u0000pub\";s:25:\"American Chemical Society\";s:10:\"\u0000*\u0000edition\";s:0:\"\";s:9:\"\u0000*\u0000tpages\";s:2:\"13\";s:9:\"\u0000*\u0000series\";s:0:\"\";s:8:\"\u0000*\u0000proxy\";s:30:\"http:\/\/proxyout.inist.fr:8080\/\";s:12:\"\u0000*\u0000integrite\";b:1;}"
arXiv access
