Preparation of silver thin films using liquid-phase precursors by metal organic chemical vapor deposition and their conversion to silver selenide films by selenium vapor deposition
- Author
- KIM, Hong-Ki1 ; JEONG, Han-Cheol1 ; KYUNG SOO KIM1 ; SEOK HWAN YOON1 ; SEUNG SOO LEE1 ; KOOK WON SEO1 ; SHIM, Il-Wun1
[1] Department of Chemistry, Chung-Ang University, Seoul 156-756, Korea, Republic of - Source
Thin solid films. 2005, Vol 478, Num 1-2, pp 72-76, 5 p ; ref : 18 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Keyword (fr)
- Argent séléniure Calorimétrie différentielle balayage Composé binaire Conductivité électrique Couche épaisse Croissance cristalline en phase vapeur Dépôt chimique phase vapeur Etude expérimentale Microscopie électronique balayage Précurseur Réseau orthorhombique Spectre IR Thermogravimétrie Ag Se Ag2Se Substrat Si Substrat verre Composé minéral Métal transition composé
- Keyword (en)
- Silver selenides Differential scanning calorimetry Binary compounds Electrical conductivity Thick films Crystal growth from vapors CVD Experimental study Scanning electron microscopy Precursor Orthorhombic lattices Infrared spectra Thermogravimetry Inorganic compounds Transition element compounds
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15G Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16627281
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2004.10.010 
https://dx.doi.org/10.1016/j.tsf.2004.10.010
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