Novel surface structure and its fabrication process for MEMS fingerprint sensor
- Author
- SATO, Norio1 ; SHIGEMATSU, Satoshi1 ; MORIMURA, Hiroki1 ; YANO, Masaki2 ; KUDOU, Kazuhisa2 ; KAMEI, Toshikazu2 ; MACHIDA, Katsuyuki1
[1] NTT Mircosystem Integration Laboratories, NTT Corporation, Kanagawa 243-0198, Japan
[2] NTT Advanced Technology Corporation, Kanagawa 243-0198, Japan - Source
I.E.E.E. transactions on electron devices. 2005, Vol 52, Num 5, pp 1026-1032, 7 p ; ref : 20 ref
- CODEN
- IETDAI
- ISSN
- 0018-9383
- Scientific domain
- Electronics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Author keyword
- CMOS large-scale integrated circuit (LSI) elasticity fingerprint sensor microelectromechanical systems (MEMS) sensitivity
- Keyword (fr)
- Capteur mesure Circuit LSI Circuit intégré CMOS Circuit intégré Couche sacrificielle Dactyloscopie Dispositif microélectromécanique Etat surface Fiabilité Procédé fabrication Rigidité diélectrique Résistance mécanique Structure surface Technologie MOS complémentaire 0707D
- Keyword (en)
- Measurement sensor LSI circuit CMOS integrated circuits Integrated circuit Sacrificial layer Fingerprint identification Microelectromechanical device Surface conditions Reliability Manufacturing process Dielectric strength Strength Surface structure Complementary MOS technology
- Keyword (es)
- Captador medida Circuito LSI Circuito integrado Capa sacrificial Dispositivo microelectromecánico Estado superficie Fiabilidad Procedimiento fabricación Resistencia dieléctrica Resistencia mecánica Estructura superficie Tecnología MOS complementario
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B00 General / 001B00G Instruments, apparatus, components and techniques common to several branches of physics and astronomy / 001B00G07 General equipment and techniques / 001B00G07D Sensors (chemical, optical, electrical, movement, gas, etc.); remote sensing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F06 Integrated circuits / 001D03F06A Design. Technologies. Operation analysis. Testing
- Pascal
- 001 Exact sciences and technology / 001D Applied sciences / 001D03 Electronics / 001D03F Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices / 001D03F21 Micro- and nanoelectromechanical devices (mems/nems)
- Discipline
- Electronics Metrology
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16714774
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1109/TED.2005.846342 
https://dx.doi.org/10.1109/TED.2005.846342
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