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Properties of LT-AlGaN films and HT-GaN films using LT-ALGaN buffer layers grown on (0001) sapphire substrates

Author
WANG, Cheng-Liang1 ; GONG, Jyh-Rong1
[1] Department of Materials Science and Engineering, Feng Chia University, Taichung 407, Taiwan, Province of China
Source

Journal of materials science. Materials in electronics. 2005, Vol 16, Num 2, pp 107-110, 4 p ; ref : 15 ref

ISSN
0957-4522
Scientific domain
Electronics; Condensed state physics
Publisher
Springer, Norwell, MA
Publication country
United States
Document type
Article
Language
English
Keyword (fr)
Aluminium nitrure Composé binaire Composé minéral Composé ternaire Couche mince Couche tampon Diffraction RX Défaut Gallium nitrure Haute température Lumière jaune Microscopie optique Microscopie électronique transmission Microstructure Optimisation Photoluminescence Surface lisse Al Ga N AlGaN Ga N GaN
Keyword (en)
Aluminium nitrides Binary compounds Inorganic compounds Ternary compounds Thin films Buffer layer XRD Defects Gallium nitrides High temperature Yellow light Optical microscopy Transmission electron microscopy Microstructure Optimization Photoluminescence Smooth surface
Keyword (es)
Capa tampón Alta temperatura Luz amarilla Superficie lisa
Classification
Pascal
001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness

Pacs
6855J Structure and morphology; thickness

Discipline
Physics of condensed state : structure, mechanical and thermal properties
Origin
Inist-CNRS
Database
PASCAL
INIST identifier
16734707

Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS

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