Synthesis of silicon dioxide film using high-concentration ozone and evaluation of the film quality
- Author
- KOIKE, Kunihiko1 ; IZUMI, Koichi1 ; NAKAMURA, Sadaki1 ; INOUE, Goichi1 ; KUROKAWA, Akira2 ; ICHIMURA, Shingo2
[1] Iwatani International Corporation, Shiga 524-0041, Japan
[2] National Institute of Advanced Industrial Science and Technology, Ibaraki 305-8568, Japan - Source
Journal of electronic materials. 2005, Vol 34, Num 3, pp 240-247, 8 p ; ref : 23 ref
- CODEN
- JECMA5
- ISSN
- 0361-5235
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Institute of Electrical and Electronics Engineers, New York, NY
- Publication country
- United States
- Document type
- Article
- Language
- English
- Author keyword
- Si ozone silicon dioxide
- Keyword (fr)
- Composé binaire Contrainte compression Couche mince Diffusion Dépendance temps Dépendance température Energie activation Epaisseur Etude expérimentale Oxydation Ozone Silicium oxyde Spectre IR Spectre photoélectron RX Spectre transformée Fourier Traitement par plasma O Si SiO2 Substrat Si Composé minéral
- Keyword (en)
- Binary compounds Compressive stress Thin films Scattering Time dependence Temperature dependence Activation energy Thickness Experimental study Oxidation Ozone Silicon oxides Infrared spectra X-ray photoelectron spectra Fourier transform spectra Plasma assisted processing Inorganic compounds
- Keyword (es)
- Tensión compresión
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B60 Condensed matter: structure, mechanical and thermal properties / 001B60H Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) / 001B60H55 Thin film structure and morphology / 001B60H55J Structure and morphology; thickness
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A65 Surface treatments
- Discipline
- Physics and materials science Physics of condensed state : structure, mechanical and thermal properties
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16756333
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s11664-005-0210-6 
https://dx.doi.org/10.1007/s11664-005-0210-6
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