Pure and cobalt-doped SnO2(101) films grown by molecular beam epitaxy on Al2O3
- Author
- BATZILL, Matthias1 ; BURST, James M1 ; DIEBOLD, Ulrike1
[1] Department of Physics, Tulane University, New Orleans, LA, United States - Source
Thin solid films. 2005, Vol 484, Num 1-2, pp 132-139, 8 p ; ref : 24 ref
- CODEN
- THSFAP
- ISSN
- 0040-6090
- Scientific domain
- Crystallography; Electronics; Metallurgy, welding; Condensed state physics
- Publisher
- Elsevier Science, Lausanne
- Publication country
- Switzerland
- Document type
- Article
- Language
- English
- Author keyword
- 68.55.-a Molecular beam epitaxy 68.55Ln 81.05.Je 81.15.Hi Electron diffraction Tin oxide X-ray photoelectron spectroscopy
- Keyword (fr)
- Addition cobalt Adhérence Composé binaire Couche mince Couche ultramince Couche épitaxique Croissance cristalline en phase vapeur Dopage Epitaxie jet moléculaire Etain oxyde Etude expérimentale Joint antiphase LEED Modèle structure Monocristal RHEED Spectre photoélectron RX Stoechiométrie Structure rutile O Sn SnO2 Substrat Al2O3 Composé minéral
- Keyword (en)
- Cobalt additions Adhesion Binary compounds Thin films Ultrathin films Epitaxial layers Crystal growth from vapors Doping Molecular beam epitaxy Tin oxides Experimental study Anti-phase boundaries LEED Structural models Monocrystals RHEED X-ray photoelectron spectra Stoichiometry Rutile structure Inorganic compounds
- Keyword (es)
- Doping Estructura rutilo
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15A Theory and models of film growth
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15H Molecular, atomic, ion, and chemical beam epitaxy
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16886660
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1016/j.tsf.2005.02.016 
https://dx.doi.org/10.1016/j.tsf.2005.02.016
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