Properties of tin sulphide thin films electrodeposited in the presence of triethanolamine
- Author
- ZAINAL, Z1 ; NAGALINGAM, S1 ; HUA, T. M1
[1] Department of Chemistry, Universiti Putra Malaysia, 43400 Serdang, Selangor, Malaysia - Source
Journal of materials science. Materials in electronics. 2005, Vol 16, Num 5, pp 281-285, 5 p ; ref : 20 ref
- ISSN
- 0957-4522
- Scientific domain
- Electronics; Condensed state physics
- Publisher
- Springer, Norwell, MA
- Publication country
- United States
- Document type
- Article
- Language
- English
- Keyword (fr)
- Adhérence Bande interdite Couche mince Cristallinité Diffraction RX Dépôt électrolytique Etain sulfure Photoconductivité Polycristal Relation fabrication propriété Reproductibilité Spectre absorption S Sn SnS Triéthanolamine
- Keyword (en)
- Adhesion Energy gap Thin films Crystallinity XRD Electrodeposition Tin sulfides Photoconductivity Polycrystals Fabrication property relation Reproducibility Absorption spectra
- Keyword (es)
- Cristalinidad Relación fabricación propiedad Reproductividad
- Classification
- Pascal
- 001 Exact sciences and technology / 001B Physics / 001B80 Cross-disciplinary physics: materials science; rheology / 001B80A Materials science / 001B80A15 Methods of deposition of films and coatings; film growth and epitaxy / 001B80A15P Electrodeposition, electroplating
- Discipline
- Physics and materials science
- Origin
- Inist-CNRS
- Database
- PASCAL
- INIST identifier
- 16956112
Sauf mention contraire ci-dessus, le contenu de cette notice bibliographique peut être utilisé dans le cadre d’une licence CC BY 4.0 Inist-CNRS / Unless otherwise stated above, the content of this bibliographic record may be used under a CC BY 4.0 licence by Inist-CNRS / A menos que se haya señalado antes, el contenido de este registro bibliográfico puede ser utilizado al amparo de una licencia CC BY 4.0 Inist-CNRS
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DOI
10.1007/s10854-005-0545-z 
https://dx.doi.org/10.1007/s10854-005-0545-z
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